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ComputerAidedPatterningDesignForSelfAssembledMicrosphereLithography

Computer-aided patterning design for self-assembled microsphere lithography Open Access

In this paper, we use a finite difference time domain solver to simulate the near field optical properties of self-assembled microsphere arrays when exposed to an incoherent light source. Such arrays are typically used for microsphere lithography where each sphere acts as a ball lens, focusing ultraviolet light into an underlying photoresist layer. It is well known that arrays of circular features can be patterned using this technique. However, here, our simulations show that additional nanometre scale features can be introduced to the pattern by optimising the sphere dimensions and exposure conditions. These features are shown to arise from the contact points between the microspheres which produce paths for light leakage. For hexagonally close packed arrays, the six points of contact lead to star shapes in the photoresist. These star shapes have subfeature sizes comparable to the current achievable resolution of low-cost fabrication techniques.

Descriptions

Resource type
Other
Contributors
Creator: Lees, Rhiannon 1
1 Durham, University, UK
Funder
Engineering and Physical Sciences Research Council
Research methods
Other description
Keyword
Microlithography
Patterning
Self-Assembly
Subject
Microlithography
Self-assembly (Chemistry)
Location
Language
Cited in
Identifier
ark:/32150/r10z708w44m
doi:10.15128/r10z708w44m
Rights
Creative Commons Attribution-NonCommercial 4.0 International (CC BY-NC)

Publisher
Durham University
Date Created

File Details

Depositor
R. Lees
Date Uploaded
Date Modified
14 March 2019, 13:03:10
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File format: zip (ZIP Format)
Mime type: application/zip
File size: 7294802
Last modified: 2019:03:14 13:15:42+00:00
Filename: Data.zip
Original checksum: 18d4d6792a04f66fa98ef3e0f9d34ae0
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