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Computer-aided patterning design for self-assembled microsphere lithography Open Access
In this paper, we use a finite difference time domain solver to simulate the near field optical properties of self-assembled microsphere arrays when exposed to an incoherent light source. Such arrays are typically used for microsphere lithography where each sphere acts as a ball lens, focusing ultraviolet light into an underlying photoresist layer. It is well known that arrays of circular features can be patterned using this technique. However, here, our simulations show that additional nanometre scale features can be introduced to the pattern by optimising the sphere dimensions and exposure conditions. These features are shown to arise from the contact points between the microspheres which produce paths for light leakage. For hexagonally close packed arrays, the six points of contact lead to star shapes in the photoresist. These star shapes have subfeature sizes comparable to the current achievable resolution of low-cost fabrication techniques.
Descriptions
- Resource type
- Other
- Contributors
- Creator:
Lees, Rhiannon
1
1 Durham, University, UK
- Funder
-
Engineering and Physical Sciences Research Council
- Research methods
- Other description
- Keyword
- Microlithography
Patterning
Self-Assembly
- Subject
-
Microlithography
Self-assembly (Chemistry)
- Location
- Language
- Cited in
- Identifier
- ark:/32150/r10z708w44m
doi:10.15128/r10z708w44m
- Rights
- Creative Commons Attribution-NonCommercial 4.0 International (CC BY-NC)
- Publisher
-
Durham University
- Date Created
File Details
- Depositor
- R. Lees
- Date Uploaded
- 14 December 2018, 11:12:24
- Date Modified
- 14 March 2019, 13:03:10
- Audit Status
- Audits have not yet been run on this file.
- Characterization
-
File format: zip (ZIP Format)
Mime type: application/zip
File size: 7294802
Last modified: 2019:03:14 13:15:42+00:00
Filename: Data.zip
Original checksum: 18d4d6792a04f66fa98ef3e0f9d34ae0
| User Activity | Date |
|---|---|
| User N. Syrotiuk has updated Computer-aided patterning design for self-assembled microsphere lithography | over 5 years ago |
| User N. Syrotiuk has added a new version of Computer-aided patterning design for self-assembled microsphere lithography | over 5 years ago |
| User N. Syrotiuk has updated Computer-aided patterning design for self-assembled microsphere lithography | over 5 years ago |
| User R. Lees has updated Computer-aided patterning design for self-assembled microsphere lithography | over 5 years ago |
| User N. Syrotiuk has updated Computer-aided patterning design for self-assembled microsphere lithography | over 5 years ago |
| User R. Lees has updated ComputerAidedPatterningDesignForSelfAssembledMicrosphereLithography.zip | over 5 years ago |
| User R. Lees has deposited ComputerAidedPatterningDesignForSelfAssembledMicrosphereLithography.zip | over 5 years ago |