Data Supporting "Interfacial contribution to thickness dependent in-plane anisotropic magnetoresistance", AIP Advances 5, 127108 (2015)

Tokac, Mustafa (Durham University, UK); Gallagher, Bryan (University of Nottingham, UK); Jaiswal, Samridh (Durham University, UK); Hindmarch, Aidan (Durham University, UK); Atkinson, Del (Durham University, UK); Wang, Mu (University of Nottingham, UK); Rushforth , Andrew (University of Nottingham, UK); Hindmarch, Aidan (Durham University, UK)

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Data Supporting "Interfacial contribution to thickness dependent in-plane anisotropic magnetoresistance", AIP Advances 5, 127108 (2015) Open Access

(Abstract from article) We have studied in-plane anisotropic magnetoresistance(AMR) in cobaltfilms with overlayers having designed electrically interface transparency. With an electrically opaque cobalt/overlayer interface, the AMR ratio is shown to vary in inverse proportion to the cobaltfilm thickness; an indication that in-plane AMR is a consequence of anisotropic scattering with both volume and interfacial contributions. The interface scattering anisotropy opposes the volume scattering contribution, causing the AMR ratio to diminish as the cobaltfilm thickness is reduced. An intrinsic interface effect explains the significantly reduced AMR ratio in ultra-thin films.

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Resource type: Dataset
Contributors: Contact person: Hindmarch, Aidan ¹
Creator: Tokac, Mustafa ¹
Creator: Wang, Mu ²
Creator: Jaiswal, Samridh ¹
Creator: Rushforth , Andrew ²
Creator: Gallagher, Bryan ²
Creator: Atkinson, Del ¹
Creator: Hindmarch, Aidan ¹

¹ Durham University, UK
² University of Nottingham, UK
Funder: Engineering and Physical Sciences Research Council
Seventh Framework Programme
Research methods
Other description
Keyword: Anisotropic Magnetoresistance
Subject
Location
Language
Cited in: doi:10.1063/1.4937556
Identifier: doi:10.15128/8g84mm241
ark:/32150/8g84mm241
Publisher: Durham University
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